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Self assembled monolayers of Octadecyltrichlorosilane for dielectric materials

Kumar, Vijay and Puri, Paridhi and Nain, Shivani and Bhat, KN and Sharma, NN (2015) Self assembled monolayers of Octadecyltrichlorosilane for dielectric materials. In: 2nd International Conference on Emerging Technologies - Micro to Nano (ETMN), OCT 24-25, 2015, Manipal Univ, Jaipur, INDIA.

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Official URL: http://dx.doi.org/10.1063/1.4945251

Abstract

Treatment of surfaces to change the interaction of fluids with them is a critical step in constructing useful microfluidics devices, especially those used in biological applications. Selective modification of inorganic materials such as Si, SiO2 and Si3N4 is of great interest in research and technology. We evaluated the chemical formation of OTS self-assembled monolayers on silicon substrates with different dielectric materials. Our investigations were focused on surface modification of formerly used common dielectric materials SiO2, Si3N4 and a-poly. The improvement of wetting behaviour and quality of monolayer films were characterized using Atomic force microscope, Scanning electron microscope, Contact angle goniometer, Raman spectroscopy and X-ray photoelectron spectroscopy ( XPS) monolayer deposited oxide surface.

Item Type: Conference Proceedings
Additional Information: Copy right for this article belongs to the AMER INST PHYSICS, 2 HUNTINGTON QUADRANGLE, STE 1NO1, MELVILLE, NY 11747-4501 USA
Department/Centre: Division of Interdisciplinary Research > Centre for Nano Science and Engineering
Depositing User: Id for Latest eprints
Date Deposited: 22 Jun 2016 06:23
Last Modified: 22 Jun 2016 06:23
URI: http://eprints.iisc.ac.in/id/eprint/54061

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