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Resputtering Effect on Nanocrystalline Ni-Ti Alloy Films

Priydarshini, Geetha B and Esakkiraja, N and Aich, Shampa and Chakraborty, M (2016) Resputtering Effect on Nanocrystalline Ni-Ti Alloy Films. In: METALLURGICAL AND MATERIALS TRANSACTIONS A-PHYSICAL METALLURGY AND MATERIALS SCIENCE, 47A (4). pp. 1751-1760.

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Official URL: http://dx.doi.org/10.1007/s11661-015-3319-0


We report on the effect of resputtering on the properties of nanocrystalline Ni-Ti alloy thin films deposited using co-sputtering of Ni and Ti targets. In order to facilitate the formation of nanocrystalline phases, films were deposited at room temperature and 573 K (300 A degrees C) with substrate bias voltage of -100 V. The influence of substrate material on the composition, surface topography microstructure, and phase formations of nanocrystalline Ni-Ti thin films was also systematically investigated. The preferential resputtering of Ti adatoms was lesser for Ni-Ti films deposited on quartz substrate owing to high surface roughness of 4.87 nm compared to roughness value of 1.27 nm for Si(100) substrate.

Item Type: Journal Article
Additional Information: Copy right for this article belongs to the SPRINGER, 233 SPRING ST, NEW YORK, NY 10013 USA
Department/Centre: Division of Mechanical Sciences > Materials Engineering (formerly Metallurgy)
Depositing User: Id for Latest eprints
Date Deposited: 02 Apr 2016 05:50
Last Modified: 02 Apr 2016 05:50
URI: http://eprints.iisc.ac.in/id/eprint/53575

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