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Effect of sputtering parameters on the structure, microstructure and magnetic properties of Tb-Fe films

Basumatary, Himalay and Chelvane, Arout J and Rao, Sridhara DV and Kamat, SV and Ranjan, Rajeev (2015) Effect of sputtering parameters on the structure, microstructure and magnetic properties of Tb-Fe films. In: THIN SOLID FILMS, 583 . pp. 1-6.

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Official URL: http://dx.doi.org/10.1016/j.tsf.2015.03.026

Abstract

The effect of sputtering parameters such as gas pressure and power on the structure, microstructure and magnetic properties of sputtered Tb-Fe thin films was investigated. X-ray diffraction and transmission electron microscopy studies showed that all the films were amorphous in nature irrespective of the sputtering parameters. A fine island kind of morphology was observed at low sputtering power whereas large clusters were seen at higher sputtering power. While the composition of Tb-Fe films remained constant with increasing sputtering power, the magnetic behaviour was found to change from superparamagnetic to ferromagnetic. On the other hand, the increase in argon gas pressure was found to deplete the iron concentration in Tb-Fe thin films, which in turn reduced the anisotropy and Curie temperature. Annealing of the films at 773 K did not result in any crystallization and the magnetic properties were also found to remain unchanged. (C) 2015 Elsevier B.V. All rights reserved.

Item Type: Journal Article
Additional Information: Copy right for this article belongs to the ELSEVIER SCIENCE SA, PO BOX 564, 1001 LAUSANNE, SWITZERLAND
Keywords: Magnetic thin films; Magnetization measurements; Microstructure
Department/Centre: Division of Mechanical Sciences > Materials Engineering (formerly Metallurgy)
Depositing User: Id for Latest eprints
Date Deposited: 29 May 2015 05:37
Last Modified: 29 May 2015 05:37
URI: http://eprints.iisc.ac.in/id/eprint/51600

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