MRT Letter: Two-Photon Excitation-Based 2pi Light-Sheet System for Nano-Lithography

Mohan, Kavya and Mondal, Partha Pratim (2015) MRT Letter: Two-Photon Excitation-Based 2pi Light-Sheet System for Nano-Lithography. In: MICROSCOPY RESEARCH AND TECHNIQUE, 78 (1). pp. 1-7.

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Abstract

We propose two-photon excitation-based light-sheet technique for nano-lithography. The system consists of 2 -configured cylindrical lens system with a common geometrical focus. Upon superposition, the phase-matched counter-propagating light-sheets result in the generation of identical and equi spaced nano-bump pattern. Study shows a feature size of as small as few tens of nanometers with a inter-bump distance of few hundred nanometers. This technique overcomes some of the limitations of existing nano-lithography techniques, thereby, may pave the way for mass-production of nano-structures. Potential applications can also be found in optical microscopy, plasmonics, and nano-electronics. Microsc. Res. Tech. 78:1-7, 2015. (c) 2014 Wiley Periodicals, Inc.

Item Type:	Editorials/Short Communications
Publication:	MICROSCOPY RESEARCH AND TECHNIQUE
Publisher:	WILEY-BLACKWELL
Additional Information:	Copyright for this article belongs to the WILEY-BLACKWELL, 111 RIVER ST, HOBOKEN 07030-5774, NJ USA
Keywords:	fluorescence microscopy; Imaging; light-sheet microscopy; optical Microscopy; nano-lithography
Department/Centre:	Division of Physical & Mathematical Sciences > Instrumentation Appiled Physics
Date Deposited:	28 Jan 2015 04:25
Last Modified:	28 Jan 2015 04:25
URI:	http://eprints.iisc.ac.in/id/eprint/50746

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