Tailoring the Microstructural, Optical, and Electrical Properties of Nanocrystalline WO3 Thin Films Using Al Doping

Mukherjee, Ramnayan and Prajapati, CS and Sahay, PP (2014) Tailoring the Microstructural, Optical, and Electrical Properties of Nanocrystalline WO3 Thin Films Using Al Doping. In: JOURNAL OF MATERIALS ENGINEERING AND PERFORMANCE, 23 (9). pp. 3141-3151.

PDF jou_mat_eng_per_23-9_3141_2014.pdf - Published Version Restricted to Registered users only Download (2MB) | Request a copy

Abstract

We have studied the influence of Al doping on the microstructural, optical, and electrical properties of spray-deposited WO3 thin films. XRD analyses confirm that all the films are of polycrystalline WO3 in nature, possessing monoclinic structure. EDX profiles of the Al-doped films show aluminum peaks implying incorporation of Al ions into WO3 lattice. On Al doping, the average crystallite size decreases due to increase in the density of nucleation centers at the time of film growth. The observed variation in the lattice parameter values on Al doping is attributed to the incorporation of Al ions into WO3 lattice. Enhancement in the direct optical band gap compared to the undoped film has been observed on Al doping due to decrease in the width of allowed energy states near the conduction band edge. The refractive indices of the films follow the Cauchy relation of normal dispersion. Electrical resistivity compared to the undoped film has been found to increase on Al doping.

Item Type:	Journal Article
Publication:	JOURNAL OF MATERIALS ENGINEERING AND PERFORMANCE
Additional Information:	Copy right for this article belongs to the SPRINGER, 233 SPRING ST, NEW YORK, NY 10013 USA
Department/Centre:	Division of Interdisciplinary Sciences > Centre for Nano Science and Engineering
Date Deposited:	10 Oct 2014 09:11
Last Modified:	10 Oct 2014 09:11
URI:	http://eprints.iisc.ac.in/id/eprint/49969

Actions (login required)

View Item