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Nanostructure Patterning on Flexible Substrates Using Electron Beam Lithography

Nagaraj, KS and Sangeeth, K and Hegde, GM (2013) Nanostructure Patterning on Flexible Substrates Using Electron Beam Lithography. In: nternational Conference on Experimental*, NOV 25-27, 2013, Bangkok, THAILAND.

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Official URL: http://dx.doi.org/ 10.1117/12.2054259

Abstract

Patterning nanostructures on flexible substrates plays a key role in the emerging flexible electronics technology. The flexible electronic devices are inexpensive and can be conformed to any shape. The potential applications for such devices are sensors, displays, solar cells, RFID, high-density biochips, optoelectronics etc. E-beam lithography is established as a powerful tool for nanoscale fabrication, but its applicability on insulating flexible substrates is often limited because of surface charging effects. This paper presents the fabrication of nanostructures on insulating flexible substrates using low energy E-beam lithography along with metallic layers for charge dissipation. Nano Structures are patterned on different substrates of materials such as acetate and PET foils. The fabrication process parameters such as the proximity gap of exposure, the exposure dosage and developing conditions have been optimized for each substrate.

Item Type: Conference Proceedings
Additional Information: Copy right for this article belongs to the SPIE-INT SOC OPTICAL ENGINEERING, 1000 20TH ST, PO BOX 10, BELLINGHAM, WA 98227-0010 USA
Department/Centre: Division of Interdisciplinary Research > Centre for Nano Science and Engineering
Depositing User: Id for Latest eprints
Date Deposited: 22 Aug 2014 11:37
Last Modified: 22 Aug 2014 11:37
URI: http://eprints.iisc.ac.in/id/eprint/49679

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