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Estimation of vapour pressure and partial pressure of subliming compounds by low-pressure thermogravimetry

Kunte, GV and Ujwala, Ail and Ajikumar, PK and Tyagi, AK and Shivashankar, SA and Umarji, AM (2011) Estimation of vapour pressure and partial pressure of subliming compounds by low-pressure thermogravimetry. In: BULLETIN OF MATERIALS SCIENCE, 34 (7). pp. 1633-1637.

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Official URL: http://www.ias.ac.in/matersci/bmsdec2011/1633.pdf

Abstract

A method for the estimation of vapour pressure and partial pressure of subliming compounds under reduced pressure, using rising temperature thermogravimetry, is described in this paper. The method is based on our recently developed procedure to estimate the vapour pressure from ambient pressure thermogravimetric data using Langmuir equation. Using benzoic acid as the calibration standard, vapour pressure temperature curves are calculated at 80, 160 and 1000 mbar for salicylic acid and vanadyl bis-2,4-pentanedionate, a precursor used for chemical vapour deposition of vanadium oxides. Using a modification of the Langmuir equation, the partial pressure of these materials at different total pressures is also determined as a function of temperature. Such data can be useful for the deposition of multi-metal oxide thin films or doped thin films by chemical vapour deposition (CVD).

Item Type: Journal Article
Additional Information: Copyright for this article belongs to Indian Academy of Sciences
Keywords: Low-pressure thermogravimetry; vapour pressure; Langmuir equation; partial pressure; precursor; metalorganic chemical vapour deposition
Department/Centre: Division of Chemical Sciences > Materials Research Centre
Depositing User: Francis Jayakanth
Date Deposited: 22 Jun 2012 10:33
Last Modified: 22 Jun 2012 10:47
URI: http://eprints.iisc.ac.in/id/eprint/44722

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