Deepak, GC and Bhat, Navakanta and Shivashankar, SA (2007) Structural and Electrical Properties of Er 203 Thin Films Deposited by RF Sputtering for Gate Dielectric Applications. In: E1-0586, 211th ECS Meeting, Chicago, USA, May 2007, USA.
Full text not available from this repository. (Request a copy)| Item Type: | Conference Paper |
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| Department/Centre: | Division of Electrical Sciences > Electrical Communication Engineering |
| Date Deposited: | 14 Oct 2011 10:13 |
| Last Modified: | 14 Oct 2011 10:13 |
| URI: | http://eprints.iisc.ac.in/id/eprint/41438 |
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