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Tantalum oxide films prepared by unbalanced reactive magnetron sputtering

Rao, Rama N and Chandramani, R and Rao, Mohan G (1999) Tantalum oxide films prepared by unbalanced reactive magnetron sputtering. In: Journal of Materials Science Letters, 18 (23). pp. 1949-1951.

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Official URL: http://www.springerlink.com/content/nq33w5j0781413...
Item Type: Journal Article
Publication: Journal of Materials Science Letters
Publisher: Springer
Additional Information: Copyright of this article belongs to Springer.
Department/Centre: Division of Physical & Mathematical Sciences > Instrumentation Appiled Physics
Date Deposited: 02 Jul 2011 06:08
Last Modified: 02 Jul 2011 06:08
URI: http://eprints.iisc.ac.in/id/eprint/38839

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