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Substrate-dependent structure, microstructure, composition and properties of nanostructured TiN films

Kiran, MSRN and Krishna, Ghanashyam M and Padmanabhan, KA (2011) Substrate-dependent structure, microstructure, composition and properties of nanostructured TiN films. In: Solid State Communications, 151 (7). pp. 561-563.

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Official URL: http://dx.doi.org/10.1016/j.ssc.2011.01.009

Abstract

Titanium nitride films of a thickness of similar to 1.5 mu m were deposited on amorphous and crystalline substrates by DC reactive magnetron sputtering at ambient temperature with 100% nitrogen in the sputter gas. The growth of nanostructured, i.e. crystalline nano-grain sized, films at ambient temperature is demonstrated. The microstructure of the films grown on crystalline substrates reveals a larger grain size/crystallite size than that of the films deposited on amorphous substrates. Specular reflectance measurements on films deposited on different substrates indicate that the position of the Ti-N 2s band at 2.33 eV is substrate-dependent, indicating substrate-mediated stoichiometry. This clearly demonstrates that not only structure and microstructure, but also chemical composition of the films is substrate-influenced. The films deposited on amorphous substrates display lower hardness and modulus values than the films deposited on crystalline substrates, with the highest value of hardness being 19 GPa on a lanthanum aluminate substrate. (C) 2011 Elsevier Ltd. All rights reserved.

Item Type: Journal Article
Additional Information: Copyright of this article belongs to Elsevier Science.
Keywords: Thin films;Optical properties;Mechanical properties
Department/Centre: Division of Mechanical Sciences > Materials Engineering (formerly Metallurgy)
Depositing User: Id for Latest eprints
Date Deposited: 15 Apr 2011 06:21
Last Modified: 15 Apr 2011 06:21
URI: http://eprints.iisc.ac.in/id/eprint/36722

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