Tanaka, S and Rajanna, K and Abe, T and Esashi, M (2001) Deep reactive ion etching of silicon carbide. In: Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 19 (6). 2173 -2176.
|
PDF
Deep_reactive.pdf Download (322kB) |
Abstract
In this article, we describe more than 100-\mu m-deep reactive ion etching (RIE) of silicon carbide (SiC) in oxygen-added sulfur hexafluoride (SF6) plasma. We used a homemade magnetically enhanced, inductively coupled plasma reactive ion etcher (ME-ICP-RIE) and electroplated nickel masks. First, 5 h etching experiments using etching gases with 0%, 5%, 10% and 20% oxygen were performed by supplying rf power of 150 and 130 W to an ICP antenna and a sample stage, respectively. They demonstrated a maximum etch rate of 0.45 \mu m/min and residue-free etching in the case of 5% oxygen addition. Observation of the cross sections of etched samples using a scanning electron microscope confirmed a microloading effect, which is reduction of the etched depth with a decrease in the mask opening width. Next, a 7 h etching experiment using an etching gas with 5% oxygen was performed by increasing the rf power to the sample stage to 150 W. This yielded an etched depth of 216 \mu m.
Item Type: | Journal Article |
---|---|
Publication: | Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures |
Publisher: | American Vacuum Society |
Additional Information: | Copyright for this article belongs to American Vacuum Society. |
Department/Centre: | Division of Physical & Mathematical Sciences > Instrumentation Appiled Physics |
Date Deposited: | 05 Apr 2005 |
Last Modified: | 22 Feb 2012 07:08 |
URI: | http://eprints.iisc.ac.in/id/eprint/2737 |
Actions (login required)
View Item |