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Dense electronic excitation induced defects in fused silica

Mohanty, T and Mishra, NC and Bhat, SV and Basu, PK and Kanjilal, D (2003) Dense electronic excitation induced defects in fused silica. In: Journal Of Physics D-Applied Physics, 36 (24). pp. 3151-3155.

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Investigation of defects created in optical grade fused silica due to 200MeV silver ion irradiation is reported. Paramagnetically positively charged oxygen vacancies or neutral dangling Si bonds (E\primecentres), non-bridging oxygen hole centres (NBOHC) and non-paramagnetic defects like B2 bands are observed. The fluence dependent optical and paramagnetic behaviours of these defects are studied using UV–visible absorption spectroscopy, photoluminescence spectroscopy, infrared (IR) absorption and electron paramagnetic resonance. It is observed that generation of E \primecentres, NBOHC and$ B_{2 }$bands gets saturated beyond a fluence of $1 × 10^{12}$ ions $cm^{-2.} $IR spectra showing saturation in transmission at this fluence also support this observation. At this fluence samples get fully covered with latent tracks containing these defects.

Item Type: Journal Article
Publication: Journal Of Physics D-Applied Physics
Publisher: IOP Publishing
Additional Information: Copyright of this article belongs to IOP Publishing.
Department/Centre: Division of Physical & Mathematical Sciences > Physics
Date Deposited: 16 Mar 2009 17:53
Last Modified: 19 Sep 2010 04:53
URI: http://eprints.iisc.ac.in/id/eprint/16749

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